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CU - Protect Driplines 

CU‑Protect driplines are a game‑changer for substrate and subsurface irrigation. Built with PC and CNL technology for unbeatable uniformity, they feature an innovative dual‑compound dripper design that forms a powerful barrier against root intrusion and biofilm build‑up. The result is a hard‑wall dripline that stays clean, resists clogging, and delivers consistent performance where growers need it most.

CU - Protect Organic Technology

The copper oxide compound incorporated into the polymer matrix of the dripper offers protection and can be used in organic applications.

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Self-compensating anti-drainage drip irrigation

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Working Pressure

0,7 - 4,0

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Pipe sizes

16 or 20mm

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Flow Rates

1.1|1.6|2.2|3.8 l/h

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Dripper Spacings

16, 20 or 25cm

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Closing Pressure

0.15 bar (1.5m)

CU - Protect PC700 Heavy wall

Reusable pipe with self-compensating drippers. Excellent raw materials - longer duration and field performance. Specially designed for sub & surface drip irrigation. Anti-siphon system, it prevents the suction of soil. Silicone membrane allows to emit a precise flow within a wide range of working pressures. High accuracy and performance without clogging.

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Labour Saving

Installation - Quick and easy installation, reducing labour costs.

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Less waist

Efficiency - Water and fertiliser applied directly to the root-zone resulting in less waste.

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Longevity

Guarantee - Up to 10 years protection from root intrusion.

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Cost saving

Maintenance - Reduces shearing problems to dripper leads on irrigation laterals.

Organic

Chemical Free Certified Organic, and worry free fro current or future regulation.

Drip Lines - Built To Last 

Designed for versatility and durability, CU‑Protect driplines offer greater flow uniformity, seasonal irrigation stability and reduced maintenance requirements. The silicone membrane ensures precise flow across a wide pressure range, while the adaptable dripper design integrates easily into multiple pipe diameters and irrigation systems. Suitable for challenging soils, high root‑density environments and adverse field conditions, these driplines are UV‑resistant, approved for organic farming, compliant with ISO 9261 and fully recyclable—making them a robust, future‑proof solution for modern growers.

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Reliablity

Cutting-edge Copper oxide root intrusion prevention technology, with added benefit of Biofilm build up control. This innovative system features optimized flow rates and precise dripper spacing, ensuring that every drop counts.

Maximum results

Maximum Results Crop after Crop.

Quick and easy to install, it delivers reliable performance crop after crop, significantly reducing labor and costs. Protect your investment and enhance your yields with our advanced solution today!

Toughness

CU-Protect PC700 Drip Lines are designed to tackle any challenge with toughness and reliability. Thanks to our innovative CNL technology, slopes are no longer a concern.

Reusable 

Plus, our commitment to using high-quality raw materials means you can easily recoil and reuse our lines, providing exceptional value for your money

Durability 

With added frost protection, you can trust that your investment is safe from damage.

And with excellent Resistant to ultraviolet (UV) rays it makes this solution perfect for any installation.

CU-Protect
Technology

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Technology In The Pipe 

Our CU‑Protect driplines integrate advanced self‑compensating AS flat dripper inserts with full pressure‑compensation (PC), delivering precise and stable flow for subsurface drip irrigation (SDI) or Substrate bags and troughs. Each emitter contains a copper‑oxide compound embedded directly into the dripper matrix, forming a functional barrier that prevents root intrusion and significantly reduces biological clogging. This technology controls the development of biofilm, algae, bacteria and fungi inside the dripper, ensuring reliable performance even in high‑value crops that demand exceptional accuracy in water and nutrient delivery. The anti‑suction (AS) system further protects the line by preventing fine soil particles from entering during lateral discharge, reducing the risk of suction‑related clogging in SDI or substrate bags and trough installations.

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